Energy, Electronic engineering, Electronics

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

Draft standard 2025-07

DIN 50450-2:2025-07 - Draft

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

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Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N₂, Ar, He, Ne and H₂ by using a galvanic cell

Standard [CURRENT] 1991-03

DIN 50450-2:1991-03

Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N₂, Ar, He, Ne and H₂ by using a galvanic cell

from 35.60 EUR VAT included

from 33.27 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonoxide, carbondioxide, hydrogen and C₁-C₃-hydrocarbons in gaseous hydrogen chloride by gaschromatography

Standard [CURRENT] 2021-07

DIN 50450-9:2021-07

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonoxide, carbondioxide, hydrogen and C₁-C₃-hydrocarbons in gaseous hydrogen chloride by gaschromatography

from 43.40 EUR VAT included

from 40.56 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

Standard [CURRENT] 2014-11

DIN 50451-3:2014-11

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

from 80.20 EUR VAT included

from 74.95 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 4: Determination of 34 elements in ultra pure water by mass spectrometry with inductively coupled plasma (ICP-MS)

Standard [CURRENT] 2024-09

DIN 50451-4:2024-09

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 4: Determination of 34 elements in ultra pure water by mass spectrometry with inductively coupled plasma (ICP-MS)

from 72.60 EUR VAT included

from 67.85 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram

Standard [CURRENT] 2022-08

DIN 50451-5:2022-08

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram

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from 54.49 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH₄F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid

Standard [CURRENT] 2014-11

DIN 50451-6:2014-11

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH₄F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid

from 65.70 EUR VAT included

from 61.40 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 7: Determination of 31 elements in high-purity hydrochloric acid by ICP-MS

Standard [CURRENT] 2018-04

DIN 50451-7:2018-04

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 7: Determination of 31 elements in high-purity hydrochloric acid by ICP-MS

from 65.70 EUR VAT included

from 61.40 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 8: Determination of 33 elements in high-purity sulfuric acid by ICP-MS

Standard [CURRENT] 2022-08

DIN 50451-8:2022-08

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 8: Determination of 33 elements in high-purity sulfuric acid by ICP-MS

from 58.30 EUR VAT included

from 54.49 EUR VAT excluded

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Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 1: Microscopic determination of particles

Standard [CURRENT] 1995-11

DIN 50452-1:1995-11

Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 1: Microscopic determination of particles

from 35.60 EUR VAT included

from 33.27 EUR VAT excluded

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