Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

Draft standard

DIN 50450-2:2025-07 - Draft

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

German title
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung von Verunreinigungen in Träger- und Dotiergasen - Teil 2: Bestimmung der Sauerstoffverunreinigung in Stickstoff, Argon, Helium, Neon und Wasserstoff mittels einer galvanischen Messzelle
Date of issue
2025-06-20
Publication date
2025-07
Original language
German
Pages
9

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Date of issue
2025-06-20
Publication date
2025-07
Original language
German
Pages
9
DOI
https://dx.doi.org/10.31030/3624965

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Content

ICS

29.045, 71.100.20

DOI

https://dx.doi.org/10.31030/3624965

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